In reactive sputtering process with an Ar + O₂ gas mixture, the plasma emission observed near the cathode changes in appearance. When the oxygen content is high, the plasma exhibits a reddish-violet ...

Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...

Reactive sputtering process employs the combination of a non inert gas, such as oxygen, and an elemental target material, such as silicon. This gas chemically reacts with the sputtered atoms within ...

Dublin, Nov. 02, 2022 (GLOBE NEWSWIRE) -- The "Global Metal Sputtering Target Material Market, by Type, by Application, Estimation & Forecast, 2017-2030" report has been added to ...

Sputtering is a well-known physical vapor deposition (PVD) method finding use in several product applications. While commercial sputter systems are designed for large scale production volume of proven ...