(Nanowerk Spotlight) Lithography is a key technology for the production of semiconductor devices. It is used to define nanoscale patterns on computer chips. Electron beam lithography (EBL) is a type ...

Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...

The semiconductor industry is rethinking the manufacturing flow for extreme ultraviolet (EUV) lithography in an effort to improve the overall process and reduce waste in the fab. Vendors currently are ...

Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...

E-beam lithography operates on principles similar to photolithography but provides significantly higher resolution. The process begins with coating a substrate with an electron-sensitive resist ...

Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...

The term nanolithography is derived from the Greek words “nanos”, meaning Dwarf; “lithos”, meaning rock; and “grapho” meaning to write. Therefore the literal translation is "tiny writing on rocks".

LEUVEN, Belgium — This week, at SPIE 2023 Advanced Lithography + Patterning Conference, in San Jose, CA, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, ...

The resolution (or minimum feature) of optical systems is well known to the microlithography community as the Rayleigh criteria. It is so well known within this community that it is rarely mentioned ...